Functional separation in two frequency operation of an inductively coupled plasma

T. Denda; Y. Miyoshi; Y. Komukai; T. Goto; Z. Lj Petrović; T. Makabe

doi:10.1063/1.1636527

Functional separation in two frequency operation of an inductively coupled plasma

T. Denda, Y. Miyoshi, Y. Komukai, T. Goto, Z. Lj Petrović, T. Makabe

研究成果: Article › 査読

64 被引用数 (Scopus)

抄録

A study was conducted on the inductively coupled plasma characteristics in pure Ar and CF₄(5%)/Ar in front of the biased electrode that was 65 mm away from the coil. A set of measurements was performed including the 3D profiles of short lived 2p_i state and the metastables towards more nonuniform profiles as pressure increases. As a result, very small effect of the gas flow was observed in the present chamber.

本文言語	English
ページ（範囲）	870-876
ページ数	7
ジャーナル	Journal of Applied Physics
巻	95
号	3
DOI	https://doi.org/10.1063/1.1636527
出版ステータス	Published - 2004 2月 1
外部発表	はい

ASJC Scopus subject areas

物理学および天文学（全般）

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10.1063/1.1636527

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Functional separation in two frequency operation of an inductively coupled plasma

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