Growth of ZnO and device applications

K. Iwata; H. Tampo; A. Yamada; P. Fons; K. Matsubara; K. Sakurai; S. Ishizuka; S. Niki

doi:10.1016/j.apsusc.2004.10.109

Growth of ZnO and device applications

K. Iwata, H. Tampo, A. Yamada, P. Fons, K. Matsubara, K. Sakurai, S. Ishizuka, S. Niki

研究成果: Conference article › 査読

35 被引用数 (Scopus)

抄録

The molecular beam epitaxy (MBE) technique was used for ZnO epitaxial growth and growth properties were evaluated. Intrinsic ZnO epilayers with mobility of 120 cm ² /(V s) and carrier concentrations of 7 × 10 ¹⁶ cm ^-3 were obtained. ZnO on Si, bandgap engineering using Se and nitrogen doping were carried out for research of device application using this growth technique. We found a large bowing parameter of 12.7 eV in ZnOSe, new ZnOSSe semiconductor that is lattice matched to Si and able to change the bandgap from UV to IR, and co-doping phenomenon of N and Ga doped ZnO.

本文言語	English
ページ（範囲）	504-510
ページ数	7
ジャーナル	Applied Surface Science
巻	244
号	1-4
DOI	https://doi.org/10.1016/j.apsusc.2004.10.109
出版ステータス	Published - 2005 5月 15
外部発表	はい
イベント	12th International Conference on Solid Films and Surfaces - Hammatsu, Japan 継続期間: 2004 6月 21 → 2004 6月 25

ASJC Scopus subject areas

化学 (全般)
凝縮系物理学
物理学および天文学（全般）
表面および界面
表面、皮膜および薄膜

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10.1016/j.apsusc.2004.10.109

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引用スタイル

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title = "Growth of ZnO and device applications",

abstract = " The molecular beam epitaxy (MBE) technique was used for ZnO epitaxial growth and growth properties were evaluated. Intrinsic ZnO epilayers with mobility of 120 cm 2 /(V s) and carrier concentrations of 7 × 10 16 cm -3 were obtained. ZnO on Si, bandgap engineering using Se and nitrogen doping were carried out for research of device application using this growth technique. We found a large bowing parameter of 12.7 eV in ZnOSe, new ZnOSSe semiconductor that is lattice matched to Si and able to change the bandgap from UV to IR, and co-doping phenomenon of N and Ga doped ZnO.",

keywords = "Bandgap engineering, II-VI, MBE, ZnO, ZnO on Si, ZnOSe, p-ZnO",

author = "K. Iwata and H. Tampo and A. Yamada and P. Fons and K. Matsubara and K. Sakurai and S. Ishizuka and S. Niki",

year = "2005",

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doi = "10.1016/j.apsusc.2004.10.109",

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journal = "Applied Surface Science",

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note = "12th International Conference on Solid Films and Surfaces ; Conference date: 21-06-2004 Through 25-06-2004",

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TY - JOUR

T1 - Growth of ZnO and device applications

AU - Iwata, K.

AU - Tampo, H.

AU - Yamada, A.

AU - Fons, P.

AU - Matsubara, K.

AU - Sakurai, K.

AU - Ishizuka, S.

AU - Niki, S.

PY - 2005/5/15

Y1 - 2005/5/15

N2 - The molecular beam epitaxy (MBE) technique was used for ZnO epitaxial growth and growth properties were evaluated. Intrinsic ZnO epilayers with mobility of 120 cm 2 /(V s) and carrier concentrations of 7 × 10 16 cm -3 were obtained. ZnO on Si, bandgap engineering using Se and nitrogen doping were carried out for research of device application using this growth technique. We found a large bowing parameter of 12.7 eV in ZnOSe, new ZnOSSe semiconductor that is lattice matched to Si and able to change the bandgap from UV to IR, and co-doping phenomenon of N and Ga doped ZnO.

AB - The molecular beam epitaxy (MBE) technique was used for ZnO epitaxial growth and growth properties were evaluated. Intrinsic ZnO epilayers with mobility of 120 cm 2 /(V s) and carrier concentrations of 7 × 10 16 cm -3 were obtained. ZnO on Si, bandgap engineering using Se and nitrogen doping were carried out for research of device application using this growth technique. We found a large bowing parameter of 12.7 eV in ZnOSe, new ZnOSSe semiconductor that is lattice matched to Si and able to change the bandgap from UV to IR, and co-doping phenomenon of N and Ga doped ZnO.

KW - Bandgap engineering

KW - II-VI

KW - MBE

KW - ZnO

KW - ZnO on Si

KW - ZnOSe

KW - p-ZnO

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DO - 10.1016/j.apsusc.2004.10.109

M3 - Conference article

AN - SCOPUS:15844387749

SN - 0169-4332

VL - 244

SP - 504

EP - 510

JO - Applied Surface Science

JF - Applied Surface Science

IS - 1-4

T2 - 12th International Conference on Solid Films and Surfaces

Y2 - 21 June 2004 through 25 June 2004

ER -

Growth of ZnO and device applications

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ASJC Scopus subject areas

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