High-pressure NO-induced mixed phase on Rh(111): Chemically driven replacement

Ryo Toyoshima, Masaaki Yoshida, Yuji Monya, Kazuma Suzuki, Kenta Amemiya, Kazuhiko Mase, Bongjin Simon Mun, Hiroshi Kondoh

研究成果: Article査読

11 被引用数 (Scopus)


The interaction between nitric oxide (NO) and Rh(111) surface has been investigated by a combination of near-ambient-pressure X-ray photoelectron spectroscopy, low energy electron diffraction, and density functional theory calculations. Under low-temperature and ultrahigh vacuum conditions, our experimental and computational results are consistent with the previous reports for NO adsorption phases on Rh(111). While at room temperature and upon exposure to gaseous NO of 100 mTorr, NO molecules partially dissociate followed by chemical removal of atomic nitrogen by NO from the surface, and the remaining atomic oxygen and NO form a NO/O mixed phase. Interestingly, this mixed phase is stable even after NO evacuation and shows a well-ordered (2 × 2) periodicity. These observations provide a new insight into the NO/Rh(111) system under near-ambient-pressure condition.

ジャーナルJournal of Physical Chemistry C
出版ステータスPublished - 2015 2月 12

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • エネルギー(全般)
  • 物理化学および理論化学
  • 表面、皮膜および薄膜


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