Hydrolysis Deposition of Thin Films of Antimony-Doped Tin Oxide

Koji Tsukuma; Tomoyuki Akiyama; Hiroaki Imai

doi:10.1111/j.1151-2916.2001.tb00755.x

Hydrolysis Deposition of Thin Films of Antimony-Doped Tin Oxide

Koji Tsukuma
, Tomoyuki Akiyama
, Hiroaki Imai

応用化学科

研究成果: Article › 査読

10 被引用数 (Scopus)

抄録

Thin films of antimony-doped tin oxide have been obtained by a new technique, the so-called hydrolysis deposition method, in which hydrolyzed solids are precipitated from metal fluoride solutions. Mixed solutions of SnF₃ and SbF₃ produce antimony- and fluorine-doped tin oxide films. The amount of antimony can be controlled in a wide range by adjusting the initial fluoride concentrations of the solution. The film containing 2.9 mol% antimony heated at 500°C has an electrical resistivity of 1.0 × 10^-3 Ω·cm, which is lower than previously obtained by wet-chemical techniques.

本文言語	English
ページ（範囲）	869-871
ページ数	3
ジャーナル	Journal of the American Ceramic Society
巻	84
号	4
DOI	https://doi.org/10.1111/j.1151-2916.2001.tb00755.x
出版ステータス	Published - 2001 4月

ASJC Scopus subject areas

セラミックおよび複合材料
材料化学

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10.1111/j.1151-2916.2001.tb00755.x

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abstract = "Thin films of antimony-doped tin oxide have been obtained by a new technique, the so-called hydrolysis deposition method, in which hydrolyzed solids are precipitated from metal fluoride solutions. Mixed solutions of SnF3 and SbF3 produce antimony- and fluorine-doped tin oxide films. The amount of antimony can be controlled in a wide range by adjusting the initial fluoride concentrations of the solution. The film containing 2.9 mol\% antimony heated at 500°C has an electrical resistivity of 1.0 {\texttimes} 10-3 Ω·cm, which is lower than previously obtained by wet-chemical techniques.",

author = "Koji Tsukuma and Tomoyuki Akiyama and Hiroaki Imai",

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AU - Tsukuma, Koji

AU - Akiyama, Tomoyuki

AU - Imai, Hiroaki

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Y1 - 2001/4

N2 - Thin films of antimony-doped tin oxide have been obtained by a new technique, the so-called hydrolysis deposition method, in which hydrolyzed solids are precipitated from metal fluoride solutions. Mixed solutions of SnF3 and SbF3 produce antimony- and fluorine-doped tin oxide films. The amount of antimony can be controlled in a wide range by adjusting the initial fluoride concentrations of the solution. The film containing 2.9 mol% antimony heated at 500°C has an electrical resistivity of 1.0 × 10-3 Ω·cm, which is lower than previously obtained by wet-chemical techniques.

AB - Thin films of antimony-doped tin oxide have been obtained by a new technique, the so-called hydrolysis deposition method, in which hydrolyzed solids are precipitated from metal fluoride solutions. Mixed solutions of SnF3 and SbF3 produce antimony- and fluorine-doped tin oxide films. The amount of antimony can be controlled in a wide range by adjusting the initial fluoride concentrations of the solution. The film containing 2.9 mol% antimony heated at 500°C has an electrical resistivity of 1.0 × 10-3 Ω·cm, which is lower than previously obtained by wet-chemical techniques.

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EP - 871

JO - Journal of the American Ceramic Society

JF - Journal of the American Ceramic Society

IS - 4

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Hydrolysis Deposition of Thin Films of Antimony-Doped Tin Oxide

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