抄録
New experimental evidence of the plasma structure has been presented in the rf glow discharge in SiH4 at 13.56 MHz by spatiotemporal emission spectroscopy. Theoretical estimation by the relaxation continuum model strongly supports the accumulative effect of the negative ion, SiHn-, by the electron attachment in the bulk plasma due to the potential barriers in the positive-ion sheath on the discharge structure.
| 本文言語 | English |
|---|---|
| ページ（範囲） | 3674-3677 |
| ページ数 | 4 |
| ジャーナル | Physical Review A |
| 巻 | 42 |
| 号 | 6 |
| DOI | |
| 出版ステータス | Published - 1990 1月 1 |
ASJC Scopus subject areas
- 原子分子物理学および光学