Influence of the electron cross-field diffusion in negative ion sources with the transverse magnetic field and the plasma-electrode bias

S. Kuppel, D. Matsushita, A. Hatayama, M. Bacal

研究成果: Article査読

4 被引用数 (Scopus)

抄録

The physical mechanisms involved in the extraction of H- ions from the negative ion source are studied with a PIC 2D3V code. The effect of a weak magnetic field transverse to the extraction direction is taken into account, along with a variable bias voltage applied on the plasma electrode (PE). In addition to previous modeling works, the electron diffusion across the magnetic field is taken into account as a simple one-dimensional random-walk process. The results show that without PE bias, the value of the diffusion coefficient has a significant influence upon the value of the extracted H- current. However, the value of this coefficient does not affect qualitatively the mechanism leading to the peak of extracted H- ion current observed for an optimum value of the PE bias.

本文言語English
論文番号02B503
ジャーナルReview of Scientific Instruments
81
2
DOI
出版ステータスPublished - 2010
外部発表はい

ASJC Scopus subject areas

  • 器械工学

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