抄録
Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) has been applied to the investigation of NO adsorption on Pt(111) under various pressures of NO (up to 1 Torr) at room temperature. Under 10-7 Torr, molecular NO occupies the most stable fcc-hollow sites and partially occupies the energetically unfavorable atop sites. NO reversibly desorbs from the atop sites after evacuation. At NO pressures higher than 10-6 Torr, however, irreversible adsorption of atomic oxygen takes place via NO dissociation, leading to the formation of NO+O domains. This result is consistent with near-edge X-ray absorption fine structure (NEXAFS) and scanning tunneling microscopy (STM) results.
| 本文言語 | English |
|---|---|
| ページ(範囲) | 17030-17035 |
| ページ数 | 6 |
| ジャーナル | Journal of Physical Chemistry C |
| 巻 | 114 |
| 号 | 40 |
| DOI | |
| 出版ステータス | Published - 2010 10月 14 |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- エネルギー一般
- 物理化学および理論化学
- 表面、皮膜および薄膜
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