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Irreversible change in the NO adsorption state on Pt(111) under high pressure studied by AP-XPS, NEXAFS, and STM

  • Toru Shimada
  • , Bongjin Simon Mun
  • , Ikuyo F. Nakai
  • , Atsushi Banno
  • , Hitoshi Abe
  • , Yasuhiro Iwasawa
  • , Toshiaki Ohta
  • , Hiroshi Kondoh

研究成果: Article査読

抄録

Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) has been applied to the investigation of NO adsorption on Pt(111) under various pressures of NO (up to 1 Torr) at room temperature. Under 10-7 Torr, molecular NO occupies the most stable fcc-hollow sites and partially occupies the energetically unfavorable atop sites. NO reversibly desorbs from the atop sites after evacuation. At NO pressures higher than 10-6 Torr, however, irreversible adsorption of atomic oxygen takes place via NO dissociation, leading to the formation of NO+O domains. This result is consistent with near-edge X-ray absorption fine structure (NEXAFS) and scanning tunneling microscopy (STM) results.

本文言語English
ページ(範囲)17030-17035
ページ数6
ジャーナルJournal of Physical Chemistry C
114
40
DOI
出版ステータスPublished - 2010 10月 14

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • エネルギー一般
  • 物理化学および理論化学
  • 表面、皮膜および薄膜

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