TY - JOUR
T1 - Liquid-immersion inclined UV lithography using cube prism and mirrors
AU - Kagawa, Gakuto
AU - Sugimoto, Takumi
AU - Takahashi, Hidetoshi
N1 - Funding Information:
This work was partly supported by Mitutoyo Association for Science and Technology (MAST).
Publisher Copyright:
© 2022 The Japan Society of Applied Physics.
PY - 2022/11
Y1 - 2022/11
N2 - This paper reports on the inclined UV lithography based on liquid immersion. The proposed method implements liquid immersion, allowing structures to be formed with a large inclination angle. The equipment comprises two adjustable mirrors and a cubic glass with a pure water chamber. UV light rays are reflected and passed through the mirrors and chamber, irradiating the target at an inclined angle. We developed the necessary equipment and fabricated the 3D microstructures. The results revealed that the inclination angle reached up to 49°, indicating exposures beyond the limits of conventional inclined UV lithography.
AB - This paper reports on the inclined UV lithography based on liquid immersion. The proposed method implements liquid immersion, allowing structures to be formed with a large inclination angle. The equipment comprises two adjustable mirrors and a cubic glass with a pure water chamber. UV light rays are reflected and passed through the mirrors and chamber, irradiating the target at an inclined angle. We developed the necessary equipment and fabricated the 3D microstructures. The results revealed that the inclination angle reached up to 49°, indicating exposures beyond the limits of conventional inclined UV lithography.
KW - MEMS
KW - inclined UV lithography
KW - liquid immersion
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U2 - 10.35848/1882-0786/ac97da
DO - 10.35848/1882-0786/ac97da
M3 - Article
AN - SCOPUS:85140823060
SN - 1882-0778
VL - 15
JO - Applied Physics Express
JF - Applied Physics Express
IS - 11
M1 - 116501
ER -