Liquid phase deposition of a film of silica with an organic functional group

The thin films of silica with an organic functional group, -CH₃,-CH=CH₂, -C₂H₄CF₃, were produced by a deposition method. In this method, the film was formed on a substrate in a solution above room temperature. The dilute solution containing organotrimethoxysilane (Si concentration 0.03 mol/1) was utilized. The addition of NH₄F promoted the film growth. The deposition film was not formed in the solution containing tetramethoxysilane. Therefore, it is assumed that the role of organic functional group is important in initiating the deposition process.