TY - JOUR
T1 - Multidirectional UV lithography via inclined/rotated mirrors for liquid materials
AU - Sugimito, Takumi
AU - Takahashi, Hidetoshi
N1 - Publisher Copyright:
© 2020 The Japan Society of Applied Physics.
PY - 2020/7/1
Y1 - 2020/7/1
N2 - This letter presents the development of an exposure equipment for inclined/rotating lithography with UV curable liquid materials. The proposed equipment is composed of inclined mirrors rotating around exposure spot and shading plate to prevent direct vertical irradiated UV light. UV light ray is reflected on the mirrors, and irradiate to the spot with inclined angle via rotation. During mirrors rotating, UV curable material located on the exposure spot keeps a quiet state. The incident angle of UV light ray is controllable by changing the mirror inclination. We developed an equipment and conducted an experiment for the fabrication of 3D structures with PEGDA.
AB - This letter presents the development of an exposure equipment for inclined/rotating lithography with UV curable liquid materials. The proposed equipment is composed of inclined mirrors rotating around exposure spot and shading plate to prevent direct vertical irradiated UV light. UV light ray is reflected on the mirrors, and irradiate to the spot with inclined angle via rotation. During mirrors rotating, UV curable material located on the exposure spot keeps a quiet state. The incident angle of UV light ray is controllable by changing the mirror inclination. We developed an equipment and conducted an experiment for the fabrication of 3D structures with PEGDA.
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U2 - 10.35848/1882-0786/ab9656
DO - 10.35848/1882-0786/ab9656
M3 - Article
AN - SCOPUS:85087102792
SN - 1882-0778
VL - 13
JO - Applied Physics Express
JF - Applied Physics Express
IS - 7
M1 - 076502
ER -