Observation of two-dimensional hole gas with mobility and carrier density exceeding those of two-dimensional electron gas at room temperature in the SiGe heterostructures

M. Myronov, K. Sawano, Y. Shiraki, T. Mouri, K. M. Itoh

研究成果: Article査読

46 被引用数 (Scopus)

抄録

Very high two-dimensional hole gas (2DHG) drift mobility of 3100 cm2 V s is obtained at extremely high density of 41× 1011 cm-2 in the modulation doped, 20 nm thick, strained Ge quantum well (QW) of SiGe heterostructure at room temperature. Very high 2DHG density is achieved by increasing the boron modulation doping, reducing the spacer layer thickness located between it and Ge QW, and increasing the valence-band offset of Ge QW, which also results in the enhancement of mobility. The obtained 2DHG mobility and carrier density exceed those reported for two-dimensional electron gas in the strained Si QW of SiGe heterostructures.

本文言語English
論文番号082108
ジャーナルApplied Physics Letters
91
8
DOI
出版ステータスPublished - 2007

ASJC Scopus subject areas

  • 物理学および天文学(その他)

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