抄録
The interaction of platinum (Pt) with electron irradiation-induced defects has been observed. Platinum in silicon increases irradiation-induced defects remarkably, especially the A center, and lowers the annealing temperature to 220°C for the A center and to 140°C for the divacancy and E center. The level Ea (0.23) in the Pt-doped silicon is the Pt(-/0) level, an acceptor like the A center. A method is suggested for activating the platinum in silicon with low-energy electron irradiation and subsequent thermal annealing and detecting it by deep level transient spectroscopy (DLTS).
本文言語 | English |
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ページ(範囲) | 515-518 |
ページ数 | 4 |
ジャーナル | Journal of Applied Physics |
巻 | 65 |
号 | 2 |
DOI | |
出版ステータス | Published - 1989 |
外部発表 | はい |
ASJC Scopus subject areas
- 物理学および天文学(全般)