TY - JOUR
T1 - Optical emission spectroscopy of pulsed inductively coupled plasma in Ar
AU - Hioki, Kazuya
AU - Itazu, Naoki
AU - Petrovic, Zoran Lj
AU - Makabe, Toshiaki
PY - 2001/11/1
Y1 - 2001/11/1
N2 - Optical emission spectroscopy has been used to study the properties of pulsed inductively coupled plasma in Ar. Both spatially resolved computerized tomography and time resolved spectroscopy have been applied. In the range between 5 mTorr and 300 mTorr, it was found that the ratio of time averaged excited state densities in pulsed and CW conditions increases from 1:3 to 3:4. This is larger than the 1:2 ratio which may be expected from the duty cycle. The variation of the emission in the OFF period requires excitation during that period, and its time dependence may be understood by following the decay of the density and mean energy of electrons, and the decay of the metastable density. In the pulsed mode the radial uniformity is generally improved at lower and slightly worse at higher pressures.
AB - Optical emission spectroscopy has been used to study the properties of pulsed inductively coupled plasma in Ar. Both spatially resolved computerized tomography and time resolved spectroscopy have been applied. In the range between 5 mTorr and 300 mTorr, it was found that the ratio of time averaged excited state densities in pulsed and CW conditions increases from 1:3 to 3:4. This is larger than the 1:2 ratio which may be expected from the duty cycle. The variation of the emission in the OFF period requires excitation during that period, and its time dependence may be understood by following the decay of the density and mean energy of electrons, and the decay of the metastable density. In the pulsed mode the radial uniformity is generally improved at lower and slightly worse at higher pressures.
KW - Emission selected CT-image
KW - Plasma structure
KW - Pulsed-ICP in Ar
KW - Radon/Abel inversion
KW - Time-resolved spectroscopy
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U2 - 10.1143/jjap.40.l1183
DO - 10.1143/jjap.40.l1183
M3 - Letter
AN - SCOPUS:0035517799
SN - 0021-4922
VL - 40
SP - L1183-L1186
JO - Japanese Journal of Applied Physics, Part 2: Letters
JF - Japanese Journal of Applied Physics, Part 2: Letters
IS - 11 A
ER -