TY - JOUR
T1 - Optical properties of site-controlled InGaAs quantum dots embedded in GaAs nanowires by selective metalorganic chemical vapor deposition
AU - Tatebayash, Jun
AU - Ota, Yasutomo
AU - Ishida, Satomi
AU - Nishioka, Masao
AU - Iwamoto, Satoshi
AU - Arakawa, Yasuhiko
PY - 2012/11
Y1 - 2012/11
N2 - We report the optical properties of site-controlled InGaAs quantum dots (QDs) embedded in GaAs nanowires (NWs) grown by selective metalorganic chemical vapor deposition (MOCVD). InGaAs/GaAs QD-in-NWs with various QD heights and In compositions are realized on patterned GaAs(111)B substrates in the form of InGaAs/GaAs heterostructures, and identified by structural analyses using scanning transmission electron microscopy, photoluminescence (PL) characterization, and numerical analyses of the band structure using a single-band effective mass approximation. Room temperature (RT) light emission is observed at 1.03 μm from InGaAs/GaAs QD-in-NWs which is indicative of the formation of high-quality InGaAs QD-in-NWs. Sharp emission peaks from exciton and biexciton of single In(Ga)As QD-in-NWs are observed by using μ-PL characterization at 10 K.
AB - We report the optical properties of site-controlled InGaAs quantum dots (QDs) embedded in GaAs nanowires (NWs) grown by selective metalorganic chemical vapor deposition (MOCVD). InGaAs/GaAs QD-in-NWs with various QD heights and In compositions are realized on patterned GaAs(111)B substrates in the form of InGaAs/GaAs heterostructures, and identified by structural analyses using scanning transmission electron microscopy, photoluminescence (PL) characterization, and numerical analyses of the band structure using a single-band effective mass approximation. Room temperature (RT) light emission is observed at 1.03 μm from InGaAs/GaAs QD-in-NWs which is indicative of the formation of high-quality InGaAs QD-in-NWs. Sharp emission peaks from exciton and biexciton of single In(Ga)As QD-in-NWs are observed by using μ-PL characterization at 10 K.
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U2 - 10.1143/JJAP.51.11PE13
DO - 10.1143/JJAP.51.11PE13
M3 - Article
AN - SCOPUS:84871370052
SN - 0021-4922
VL - 51
JO - Japanese journal of applied physics
JF - Japanese journal of applied physics
IS - 11 PART2
M1 - 11PE13
ER -