Oxygen atom density in rare gas diluted O2 radio frequency plasma

Takeshi Kitajima; Junta Nakashima; Toshiki Nakano; Toshiaki Makabe

doi:10.1016/j.tsf.2005.08.091

Oxygen atom density in rare gas diluted O₂ radio frequency plasma

Takeshi Kitajima, Junta Nakashima, Toshiki Nakano, Toshiaki Makabe

常任理事

研究成果: Article › 査読

8 被引用数 (Scopus)

抄録

The influence of rare gas dilution on absolute oxygen atom density in O₂ radio frequency (RF) capacitively coupled plasma (CCP) was investigated by vacuum ultraviolet absorption spectroscopy (VUVAS) with pulse modulation of main plasma. Helium dilution is effective for raising O atom density at high total pressure (5 Torr) due to the Penning ionization by metastable He. Argon and Krypton dilution keeps O atom density same to pure O₂ case at 0.5 Torr while helium dilution lowers the O atom density by the enhanced diffusion flux of O atoms toward walls. The trend is supported by a diffusion model of O atoms.

本文言語	English
ページ（範囲）	489-493
ページ数	5
ジャーナル	Thin Solid Films
巻	506-507
DOI	https://doi.org/10.1016/j.tsf.2005.08.091
出版ステータス	Published - 2006 5月 26

ASJC Scopus subject areas

電子材料、光学材料、および磁性材料
表面および界面
表面、皮膜および薄膜
金属および合金
材料化学

文献へのアクセス

10.1016/j.tsf.2005.08.091

他のファイルとリンク

引用スタイル

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abstract = "The influence of rare gas dilution on absolute oxygen atom density in O2 radio frequency (RF) capacitively coupled plasma (CCP) was investigated by vacuum ultraviolet absorption spectroscopy (VUVAS) with pulse modulation of main plasma. Helium dilution is effective for raising O atom density at high total pressure (5 Torr) due to the Penning ionization by metastable He. Argon and Krypton dilution keeps O atom density same to pure O2 case at 0.5 Torr while helium dilution lowers the O atom density by the enhanced diffusion flux of O atoms toward walls. The trend is supported by a diffusion model of O atoms.",

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author = "Takeshi Kitajima and Junta Nakashima and Toshiki Nakano and Toshiaki Makabe",

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doi = "10.1016/j.tsf.2005.08.091",

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T1 - Oxygen atom density in rare gas diluted O2 radio frequency plasma

AU - Kitajima, Takeshi

AU - Nakashima, Junta

AU - Nakano, Toshiki

AU - Makabe, Toshiaki

PY - 2006/5/26

Y1 - 2006/5/26

N2 - The influence of rare gas dilution on absolute oxygen atom density in O2 radio frequency (RF) capacitively coupled plasma (CCP) was investigated by vacuum ultraviolet absorption spectroscopy (VUVAS) with pulse modulation of main plasma. Helium dilution is effective for raising O atom density at high total pressure (5 Torr) due to the Penning ionization by metastable He. Argon and Krypton dilution keeps O atom density same to pure O2 case at 0.5 Torr while helium dilution lowers the O atom density by the enhanced diffusion flux of O atoms toward walls. The trend is supported by a diffusion model of O atoms.

AB - The influence of rare gas dilution on absolute oxygen atom density in O2 radio frequency (RF) capacitively coupled plasma (CCP) was investigated by vacuum ultraviolet absorption spectroscopy (VUVAS) with pulse modulation of main plasma. Helium dilution is effective for raising O atom density at high total pressure (5 Torr) due to the Penning ionization by metastable He. Argon and Krypton dilution keeps O atom density same to pure O2 case at 0.5 Torr while helium dilution lowers the O atom density by the enhanced diffusion flux of O atoms toward walls. The trend is supported by a diffusion model of O atoms.

KW - 169 Glow discharge

KW - 346 Optical spectroscopy

KW - 355 Oxygen

KW - 373 Plasma processing and deposition

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DO - 10.1016/j.tsf.2005.08.091

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