Pt-implanted boron-doped diamond electrodes and the application for electrochemical detection of hydrogen peroxide

Tribidasari A. Ivandini; Rika Sato; Yoshihiro Makide; Akira Fujishima; Yasuaki Einaga

doi:10.1016/j.diamond.2005.08.022

Pt-implanted boron-doped diamond electrodes and the application for electrochemical detection of hydrogen peroxide

Tribidasari A. Ivandini
, Rika Sato
, Yoshihiro Makide
, Akira Fujishima
, Yasuaki Einaga

化学科

研究成果: Conference article › 査読

66 被引用数 (Scopus)

抄録

Pt-modified diamond electrodes were fabricated for electroanalytical applications by implantation method at 750 keV Pt²⁺ with a dose of 5 × 10¹⁴ cm^{- 2}. The electrochemical behavior has been studied for oxidation of hydrogen peroxide by using cyclic voltammetry and flow injection analysis in phosphate buffer solution (pH 7). The electrode exhibited high catalytic activity and excellent electrochemical stability with a very low background current in comparison to Pt metal electrode. Very low limit of detection, 30 nM (S / N = 3), were examined with RSD of 2.91% (n = 20). These results indicate that metal-implanted method could be a promising method for controlling the electrochemical properties of diamond electrodes.

本文言語	English
ページ（範囲）	2133-2138
ページ数	6
ジャーナル	Diamond and Related Materials
巻	14
号	11-12
DOI	https://doi.org/10.1016/j.diamond.2005.08.022
出版ステータス	Published - 2005 11月
イベント	Proceedings of the 10th International Conference on New Diamond Science and Technology (ICNDST-10) ICNDST-10 Special Issue - 継続期間: 2005 5月 11 → 2005 5月 14

ASJC Scopus subject areas

電子材料、光学材料、および磁性材料
化学一般
機械工学
材料化学
電子工学および電気工学

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10.1016/j.diamond.2005.08.022

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@article{b746141128e24455a7c2e840e4054c8b,

title = "Pt-implanted boron-doped diamond electrodes and the application for electrochemical detection of hydrogen peroxide",

abstract = "Pt-modified diamond electrodes were fabricated for electroanalytical applications by implantation method at 750 keV Pt2+ with a dose of 5 × 1014 cm- 2. The electrochemical behavior has been studied for oxidation of hydrogen peroxide by using cyclic voltammetry and flow injection analysis in phosphate buffer solution (pH 7). The electrode exhibited high catalytic activity and excellent electrochemical stability with a very low background current in comparison to Pt metal electrode. Very low limit of detection, 30 nM (S / N = 3), were examined with RSD of 2.91\% (n = 20). These results indicate that metal-implanted method could be a promising method for controlling the electrochemical properties of diamond electrodes.",

keywords = "Diamond electrodes, Electrochemical detection, Flow injection, Hydrogen peroxide, Ion implantation, Platinum",

author = "Ivandini, \{Tribidasari A.\} and Rika Sato and Yoshihiro Makide and Akira Fujishima and Yasuaki Einaga",

note = "Copyright: Copyright 2008 Elsevier B.V., All rights reserved.; Proceedings of the 10th International Conference on New Diamond Science and Technology (ICNDST-10) ICNDST-10 Special Issue ; Conference date: 11-05-2005 Through 14-05-2005",

year = "2005",

month = nov,

doi = "10.1016/j.diamond.2005.08.022",

language = "English",

volume = "14",

pages = "2133--2138",

journal = "Diamond and Related Materials",

issn = "0925-9635",

publisher = "Elsevier B.V.",

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}

TY - JOUR

T1 - Pt-implanted boron-doped diamond electrodes and the application for electrochemical detection of hydrogen peroxide

AU - Ivandini, Tribidasari A.

AU - Sato, Rika

AU - Makide, Yoshihiro

AU - Fujishima, Akira

AU - Einaga, Yasuaki

PY - 2005/11

Y1 - 2005/11

N2 - Pt-modified diamond electrodes were fabricated for electroanalytical applications by implantation method at 750 keV Pt2+ with a dose of 5 × 1014 cm- 2. The electrochemical behavior has been studied for oxidation of hydrogen peroxide by using cyclic voltammetry and flow injection analysis in phosphate buffer solution (pH 7). The electrode exhibited high catalytic activity and excellent electrochemical stability with a very low background current in comparison to Pt metal electrode. Very low limit of detection, 30 nM (S / N = 3), were examined with RSD of 2.91% (n = 20). These results indicate that metal-implanted method could be a promising method for controlling the electrochemical properties of diamond electrodes.

AB - Pt-modified diamond electrodes were fabricated for electroanalytical applications by implantation method at 750 keV Pt2+ with a dose of 5 × 1014 cm- 2. The electrochemical behavior has been studied for oxidation of hydrogen peroxide by using cyclic voltammetry and flow injection analysis in phosphate buffer solution (pH 7). The electrode exhibited high catalytic activity and excellent electrochemical stability with a very low background current in comparison to Pt metal electrode. Very low limit of detection, 30 nM (S / N = 3), were examined with RSD of 2.91% (n = 20). These results indicate that metal-implanted method could be a promising method for controlling the electrochemical properties of diamond electrodes.

KW - Diamond electrodes

KW - Electrochemical detection

KW - Flow injection

KW - Hydrogen peroxide

KW - Ion implantation

KW - Platinum

UR - https://www.scopus.com/pages/publications/27744561750

UR - https://www.scopus.com/pages/publications/27744561750#tab=citedBy

U2 - 10.1016/j.diamond.2005.08.022

DO - 10.1016/j.diamond.2005.08.022

M3 - Conference article

AN - SCOPUS:27744561750

SN - 0925-9635

VL - 14

SP - 2133

EP - 2138

JO - Diamond and Related Materials

JF - Diamond and Related Materials

IS - 11-12

T2 - Proceedings of the 10th International Conference on New Diamond Science and Technology (ICNDST-10) ICNDST-10 Special Issue

Y2 - 11 May 2005 through 14 May 2005

ER -

Pt-implanted boron-doped diamond electrodes and the application for electrochemical detection of hydrogen peroxide

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