Simulations of rf glow discharges in SF6 by the relaxation continuum model: Physical structure and function of the narrow-gap reactive-ion etcher
- Nobuhiko Nakano
- , Naohiko Shimura
- , Zoran Lj Petrović
- , Toshiaki Makabe
研究成果: Article › 査読
115
リンクは新しいタブで開きます
被引用数
(Scopus)