Micro- and nanostructuring are very important for the fabrication of new materials and multifunctional devices. Existing photo-lithographic technologies can only be applied to a limited number of materials and used on plane surfaces. Whereas, microstructuring with femtosecond laser pulses has established itself as an excellent and universal tool for micro-processing, it is still unclear what are the limits of this technology. It is of great interest to use this technique also for nanostructuring. With tightly focused femtosecond laser pulses one can produce sub-micrometer holes and structures whose quality depends on the material. We present new results on nanostructuring of different materials with femtosecond laser pulses in an attempt to make this an universal technology, and discuss its reproducibility, and further prospects for quality control.
|Proceedings of SPIE - The International Society for Optical Engineering
|Published - 2004
|Fifth International Symposium on Laser Precision Microfabrication - Nara, Japan
継続期間: 2004 5月 11 → 2004 5月 14
ASJC Scopus subject areas
- コンピュータ サイエンスの応用